Company Filing History:
Years Active: 2000
Title: Innovations of Su-Ying Su in Semiconductor Technology
Introduction
Su-Ying Su is a notable inventor based in Taipei, Taiwan. She has made significant contributions to the field of semiconductor technology, particularly in the development of processes that enhance the performance and reliability of electronic components. With a total of 2 patents, her work has had a substantial impact on the industry.
Latest Patents
Su-Ying Su's latest patents include a process for the removal of SOG etchback residue by argon treatment. This innovative method involves using a mix of CHF₃ and CF₄ in an argon carrier gas to etch back SOG during planarization. The process is characterized by an RF discharge initiated for about 10 seconds, followed by a high flow rate of argon to ensure no polymeric residue is generated on exposed titanium nitride surfaces. Another significant patent is a method for making improved polysilicon FET gate electrodes with composite sidewall spacers. This method enhances the reliability of contacts and prevents leakage currents by utilizing a SiO₂ stress-release layer and a Si₃N₄ layer to protect the source/drain areas during etching.
Career Highlights
Su-Ying Su is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where she continues to innovate and contribute to advancements in semiconductor manufacturing. Her expertise in etching processes and gate electrode fabrication has positioned her as a key player in the field.
Collaborations
Some of her notable coworkers include Meng-Chang Liu and Jyh-Feng Lin, who have collaborated with her on various projects within the semiconductor industry.
Conclusion
Su-Ying Su's contributions to semiconductor technology through her innovative patents and collaborative efforts highlight her importance in the field. Her work continues to influence the development of more efficient and reliable electronic components.