Location History:
- Tahsi Taoyuan, TW (1996)
- Tadyuan, TW (1999)
Company Filing History:
Years Active: 1996-1999
Title: Su Lu: Innovator in Power MOSFET Technology
Introduction
Su Lu is a prominent inventor based in Tahsi Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of power MOSFET devices. With a total of 2 patents to his name, Su Lu continues to push the boundaries of innovation in this critical area of electronics.
Latest Patents
Su Lu's latest patents include a groundbreaking design for a low resistance, high breakdown voltage power MOSFET. This metal oxide semiconductor field effect transistor power device features a lightly doped silicon substrate, which includes a source region and a drain region. The design incorporates at least one field implanted island region formed along the surface of the substrate between the source and drain regions. A field oxide region is formed above the field implanted region, along with a dielectric layer and a gate electrode positioned over the substrate. Self-aligned source and drain regions are implanted into the device, with external electrodes connected to them. Another patent focuses on the method of manufacturing this innovative power device, emphasizing the same structural elements and configurations.
Career Highlights
Su Lu is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to collaborate with other talented professionals and contribute to cutting-edge technology in power devices.
Collaborations
Some of Su Lu's notable coworkers include Ching-Hsiang Hsu and Ta-chi Kuo, who have also made significant contributions to the field of semiconductor technology.
Conclusion
Su Lu's innovative work in power MOSFET technology exemplifies the spirit of invention and progress in the semiconductor industry. His patents reflect a commitment to advancing technology and improving device performance.