Location History:
- Poughkeepsie, NY (US) (1980)
- Shelburne, VT (US) (1986 - 1992)
Company Filing History:
Years Active: 1980-1992
Title: **Stuart E Greer: A Pioneer in Vapor Deposition Technologies**
Introduction
Stuart E Greer is an inventive mind hailing from Shelburne, Vermont, who holds an impressive portfolio of five patents. His innovative work primarily centers around methods and apparatuses utilized in the vapor deposition of materials—a critical process in various technological and manufacturing applications.
Latest Patents
Among his latest contributions, Greer has developed a sophisticated method and apparatus for vapor deposition of materials onto substrates. This invention involves a unique mesh member impregnated with the material intended for vapor deposition. By heating the mesh, the material vaporizes and condenses onto the substrate, ensuring efficient application. Another notable patent is the lift-off process for terminal metals, which enhances the removal of unwanted metallization from semiconductor devices. This technique not only minimizes the time required for the removal process but also reduces the thickness of the metal coating needed, showcasing Greer's innovative approach to modern challenges in semiconductor technology.
Career Highlights
Greer's professional endeavors are primarily linked to the renowned International Business Machines Corporation (IBM), where he has contributed significantly to advancements in semiconductor and material deposition technologies. His work at IBM underlines his commitment to enhancing efficiency and effectiveness in industrial processes.
Collaborations
Throughout his career, Greer has collaborated with esteemed colleagues such as William E Dougherty, Jr. and William J Nestork. These partnerships have further enriched his contributions to the field, promoting shared knowledge and innovative solutions within the domain of material science and engineering.
Conclusion
Stuart E Greer's inventive solutions and patents form an integral part of the evolving landscape of vapor deposition technologies. His continued work in this field not only reflects his expertise but also contributes to the advancement of modern engineering and technology. As he progresses in his career, Greer's innovations will likely pave the way for future advancements in semiconductor and material deposition methods.