The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 1986
Filed:
Mar. 18, 1985
William E Dougherty, Jr, Poughkeepsie, NY (US);
Stuart E Greer, Shelburne, VT (US);
Robert W Sargent, LaGrangeville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of making an aperture of a predetermined shape into a dielectric substrate which will lockingly receive a deformable contact pin. It includes providing a dielectric material which shrinks in response to a heat treatment by an amount which is different in one direction from that in another direction, and which irreversibly changes dimensions in its two orthogonal directions in proportion to this difference. An aperture is formed in such a material, in a direction normal to the plane of the two orthogonal directions and the material is subjected to a heat treatment that causes a differential shrinkage in the aperture and a change in the shape of the aperture. A deformable contact pin is then forced into a locking position in the aperture. By using such a method to lock a contact pin in close proximity to a conductive line extending across the substrate or by having the aperture and the pin extend through the substrate, electrical circuits on one side of the substrate can be contacted through a contact pin on the opposite side of the substrate.