Stuart E Brown

Title: The Innovative Contributions of Stuart E. Brown

Introduction

Stuart E. Brown is a prominent inventor based in Austin, TX, known for his significant contributions to the field of semiconductor technology. With a total of 7 patents to his name, he has made remarkable advancements that have impacted the industry.

Latest Patents

Among his latest patents is the "Phase-shift photomask for patterning high density features." This invention involves a method for forming a photomask that includes providing a transparent substrate and forming an opaque layer over at least a portion of the substrate. The opaque layer is patterned to define a mask pattern, exposing a second portion of the substrate, which is then etched to create a phase-shifting region. The critical dimension of this region is measured and adjusted to enhance the photomask's performance. Another notable patent is the "Semiconductor feature having support islands," which describes a photomask that includes a transparent substrate and a line patterning feature with adjacent island patterning features. This innovation is crucial for fabricating features on a wafer using a radiation source.

Career Highlights

Stuart E. Brown is currently employed at Advanced Micro Devices Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced photomask techniques that are essential for modern manufacturing processes.

Collaborations

Throughout his career, Stuart has collaborated with notable colleagues, including Paul W. Ackmann and Khanh B. Nguyen. These partnerships have fostered a creative environment that has led to groundbreaking innovations in the field.

Conclusion

Stuart E. Brown's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the industry. His work continues to influence advancements in photomask technology, showcasing the importance of innovation in driving progress.