The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2003
Filed:
Jun. 25, 1999
John L. Nistler, Martindale, TX (US);
Stuart E. Brown, Austin, TX (US);
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
A photomask includes a transparent substrate, a line patterning feature having ends formed on the transparent substrate, and an island patterning feature adjacent at least one of the ends of the line patterning feature. A method for fabricating a feature on a wafer includes providing a photomask. The photomask includes a transparent substrate, a line patterning feature having ends formed on the transparent substrate, and an island patterning feature adjacent at least one of the ends of the line patterning feature. A radiation source adapted to supply incident radiation is provided, and a wafer is exposed with the incident radiation through the photomask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile