Kalispell, MT, United States of America

Stuart Crane

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2023

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5 patents (USPTO):Explore Patents

Title: The Innovations of Stuart Crane in Electrochemical Plating

Introduction

Stuart Crane is a notable inventor based in Kalispell, MT, United States. With a strong background in electrochemical processes, he has contributed significantly to his field with a total of five patents. His work primarily focuses on improving electrochemical plating methods, an essential aspect of semiconductor manufacturing.

Latest Patents

Among his significant contributions, Stuart Crane’s latest patents include methods aimed at reducing or eliminating deposits after electrochemical plating in electroplating processors. His patented methods and apparatus address the formation of insoluble deposits in semiconductor electrochemical plating equipment. The process involves removing the electrochemical plating equipment from the plating solution when residual solution lies atop the equipment. It entails contacting the residual solution, which has a specific pH, with a rinse agent of similar pH to form a rinsate, which is then removed, effectively mitigating deposit formation during electrochemical plating.

Career Highlights

Stuart Crane currently works at Applied Materials, Inc., a leading company in his field that specializes in providing equipment and services for semiconductor manufacturing. His innovative contributions have helped advance processes critical to the semiconductor industry and have garnered recognition among peers and collaborators alike.

Collaborations

Stuart Crane collaborates with fellow inventors such as Eric J. Bergman and John Lee Klocke, working together to push the boundaries of electrochemical technology. These collaborations enhance the innovation process, driving forward advancements in semiconductor manufacturing through shared knowledge and expertise.

Conclusion

Stuart Crane's contributions to electrochemical plating represent significant advancements in semiconductor technology. With his latest patents focusing on reducing deposits during the plating process, he continues to play a crucial role in the evolution of manufacturing techniques within the industry, establishing himself as a key inventor in this specialized field.

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