The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2023

Filed:

May. 23, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Eric J. Bergman, Kalispell, MT (US);

Stuart Crane, Kalispell, MT (US);

Tricia A. Youngbull, Whitefish, MT (US);

Timothy G. Stolt, Kalispell, MT (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 17/02 (2006.01); B08B 3/08 (2006.01); C25D 21/08 (2006.01);
U.S. Cl.
CPC ...
C25D 21/08 (2013.01); B08B 3/08 (2013.01); B08B 17/02 (2013.01);
Abstract

Methods and apparatus for reducing the formation of insoluble deposits in semiconductor electrochemical plating equipment or a surface thereof during electrochemical plating, including: removing electrochemical plating equipment or a surface thereof from an electroplating solution, wherein residual electroplating solution is disposed atop the electrochemical plating equipment or a surface thereof, and wherein the residual electroplating solution has a first pH; contacting the residual electroplating solution with a rinse agent having a second pH similar to the first pH to form a rinsate; and removing the rinsate from the electrochemical plating equipment or a surface thereof.


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