The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
May. 26, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Paul R. McHugh, Kalispell, MT (US);
Kyle Moran Hanson, Kalispell, MT (US);
John L. Klocke, Kalispell, MT (US);
Eric J. Bergman, Kalispell, MT (US);
Stuart Crane, Kalispell, MT (US);
Gregory J. Wilson, Kalispell, MT (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
In systems and methods for removing a photoresist film off of a wafer, the wafer is moved into a bath of a process liquid in a process tank. The process liquid removes the photoresist film from the wafer. The process liquid is pumped from the process tank to a filter assembly and moved through filter media to filter out solids from the process liquid, and the filtered process liquid is returned to the process tank. A scraper scrapes the filter media to prevent clogging of the filter media by accumulated solids.