The Hague, Netherlands

Stijn Willem Herman Steenbrink

This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignee: Mapper Lithography IP B.v.. Active years: 2013-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stijn Willem Herman Steenbrink. Retrieved from https://idiyas.com/inventor/stijn-willem-herman-steenbrink

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2013-2015

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3 patents (USPTO):Explore Patents

Title: Stijn Willem Herman Steenbrink: Innovator in Charged Particle Beam Technology

Introduction

Stijn Willem Herman Steenbrink is a notable inventor based in The Hague, Netherlands. He has made significant contributions to the field of charged particle beam technology, holding three patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is the "Enhanced Integrity Projection Lens Assembly." This invention relates to a projection lens assembly module designed to direct multiple charged particle beamlets onto an image plane located downstream. The invention emphasizes a modular design that enhances structural integrity and improves the placement precision of its downstream electrode. Another significant patent is the "High Voltage Shielding Arrangement of a Charged Particle Lithography System." This invention involves a high voltage shielding arrangement that includes a first metal part and a second metal part positioned in close proximity. The second metal part is set at a lower electrical potential than the first, ensuring effective shielding and safety in charged particle lithography applications.

Career Highlights

Stijn is currently associated with Mapper Lithography IP B.V., a company that specializes in advanced lithography systems. His work at Mapper Lithography has positioned him as a key player in the development of innovative technologies that enhance the capabilities of charged particle lithography.

Collaborations

Throughout his career, Stijn has collaborated with notable colleagues, including Johan Joost Koning and Bart Schipper. These collaborations have contributed to the advancement of technologies in the field of charged particle beam applications.

Conclusion

Stijn Willem Herman Steenbrink is a distinguished inventor whose work in charged particle beam technology has led to significant advancements in the field. His patents reflect a commitment to innovation and excellence, making him a valuable contributor to the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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