Company Filing History:
Years Active: 2000-2005
Title: The Innovative Contributions of Steven P Cooper
Introduction
Steven P Cooper is a notable inventor based in Battle Ground, WA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving processes that enhance the quality and efficiency of semiconductor manufacturing.
Latest Patents
One of Cooper's latest patents is a method of reducing particulate contamination during the polishing of a wafer. This innovative approach minimizes the adherence of abrasive particles to the surface of semiconductor wafers, resulting in a product with fewer defects. The method consists of two stages, with the first stage employing traditional chemical mechanical polishing techniques. The second stage diverges from conventional practices by utilizing a final polishing step that involves a polishing solution devoid of abrasive particles.
Another significant patent by Cooper is related to the use of a hydrogen peroxide solution for post-lapping cleaning of silicon wafers. This method involves treating lapped wafer surfaces with an aqueous solution containing 0.5 to 2% by weight of hydrogen peroxide, followed by a drying process. This technique effectively cleans and passivates the wafer surfaces, enhancing their quality.
Career Highlights
Throughout his career, Steven P Cooper has worked with various companies, including Seh America, Inc. His experience in the semiconductor industry has allowed him to develop innovative solutions that address common challenges in wafer processing.
Collaborations
Cooper has collaborated with professionals in his field, including Michito Sato, to further advance semiconductor technologies. Their joint efforts have contributed to the development of effective methods that improve wafer quality and processing efficiency.
Conclusion
Steven P Cooper's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods for wafer polishing and cleaning continue to impact the industry positively.