The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2000
Filed:
Jan. 28, 1998
Applicant:
Inventors:
Steven P Cooper, Battle Ground, WA (US);
Michito Sato, Vancouver, WA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C / ; C23G / ;
U.S. Cl.
CPC ...
134-2 ; 510175 ;
Abstract
A method for post lapping cleaning of silicon wafers wherein the lapped wafer surfaces are cleaned and passivated by being treated with an aqueous hydrogen peroxide solution of about 0.5 to 2% by weight of hydrogen peroxide and then dried.
Cooper, Steven. (2000). Use of h.sub.2 o.sub.2 solution as a method of post lap cleaning (U.S. Patent No. 6063205). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6063205
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile