Steven Medd

Title: Steven Medd: Innovator in Microelectronic Cleaning Solutions

Introduction

Steven Medd is a notable inventor based in Danbury, CT (US), recognized for his contributions to the field of microelectronics. He holds 2 patents that focus on advanced cleaning compositions and processes for microelectronic devices. His work is pivotal in ensuring the efficiency and integrity of microelectronic components.

Latest Patents

Medd's latest patents include a "Tungsten post-CMP cleaning composition," which details a removal composition and process designed to clean post-chemical mechanical polishing (CMP) contaminants and particles from microelectronic devices. This innovative composition incorporates at least one organic additive, one metal chelating agent, and one polyelectrolyte, achieving effective removal of particles without compromising the low-k dielectric, silicon nitride, and tungsten-containing layers. Another significant patent is the "Post chemical mechanical polishing formulations and method of use," which presents a cleaning composition that is substantially devoid of alkali hydroxides and achieves highly efficacious cleaning of post-CMP residue and contaminants while preserving the integrity of low-k dielectric and copper interconnect materials.

Career Highlights

Steven Medd is currently employed at Entegris, Inc., where he continues to develop innovative solutions for the microelectronics industry. His expertise in cleaning compositions has made a significant impact on the efficiency of microelectronic device manufacturing.

Collaborations

Medd has collaborated with notable colleagues, including Laisheng Sun and Peng Zhang, contributing to advancements in microelectronic cleaning technologies.

Conclusion

Steven Medd's work in developing cleaning compositions for microelectronic devices showcases his innovative spirit and dedication to enhancing manufacturing processes. His patents reflect a commitment to improving the efficiency and reliability of microelectronic components.