The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Mar. 09, 2017
Entegris, Inc., Billerica, MA (US);
Thomas Parson, Meriden, CT (US);
Shrane-ning Jenq, Hsin-chu, TW;
Steven Medd, Danbury, CT (US);
Daniela White, Ridgefield, CT (US);
Michael White, Ridgefield, CT (US);
Donald Frye, Sherman, CT (US);
Thomas Parson, Meriden, CT (US);
Shrane-Ning Jenq, Hsin-chu, TW;
Steven Medd, Danbury, CT (US);
Daniela White, Ridgefield, CT (US);
Michael White, Ridgefield, CT (US);
Donald Frye, Sherman, CT (US);
ENTEGRIS, INC., Billerica, MA (US);
Abstract
A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and particles from a microelectronic device having said particles and contaminants thereon. The removal compositions include at least one at least one organic additive; at least one metal chelating agent; and at least one polyelectrolyte. The composition achieves highly efficacious removal of the particles and CMP contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, and metal containing layers such as tungsten-containing layers.