Shrane-Ning Jenq

Title: Innovations of Shrane-Ning Jenq

Introduction

Shrane-Ning Jenq is a prominent inventor based in Hsin-Chu, Taiwan. She has made significant contributions to the field of microelectronics, particularly in the area of cleaning compositions used in the manufacturing process. Her innovative work has led to the development of a patented cleaning composition that addresses critical challenges in the industry.

Latest Patents

Shrane-Ning Jenq holds a patent for a Tungsten post-CMP cleaning composition. This removal composition and process are designed for cleaning post-chemical mechanical polishing (CMP) contaminants and particles from microelectronic devices. The composition includes at least one organic additive, at least one metal chelating agent, and at least one polyelectrolyte. It achieves highly effective removal of particles and CMP contaminant material from the surface of microelectronic devices without compromising the integrity of low-k dielectrics, silicon nitride, and metal-containing layers, such as tungsten-containing layers.

Career Highlights

Shrane-Ning Jenq is currently employed at Entegris, Inc., where she continues to advance her research and development efforts. Her work has been instrumental in enhancing the efficiency and effectiveness of cleaning processes in the microelectronics industry.

Collaborations

Some of her notable coworkers include Thomas Parson and Steven Medd, who contribute to the collaborative environment at Entegris, Inc.

Conclusion

Shrane-Ning Jenq's innovative contributions to the field of microelectronics, particularly through her patented cleaning composition, highlight her role as a leading inventor in the industry. Her work not only addresses current challenges but also paves the way for future advancements in microelectronic device manufacturing.