This inventor holds 2 USPTO granted patents. Top assignee: Advanced Ion Beam Technology, Inc.. Active years: 2011-2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011-2012
Title: The Innovations of Steven Fong
Introduction
Steven Fong is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of ion implantation technology. With a total of 2 patents to his name, Fong continues to push the boundaries of innovation in his industry.
Latest Patents
Fong's latest patents include a method and apparatus for dechucking an electrostatic chuck. This invention allows gas to escape through an opening between a wafer and a chuck during a multi-stage process. By reducing the chucking voltage below the threshold needed to hold the wafer, the gas can effectively push the wafer away, increasing the dechucking rate. This method minimizes potential damage to the wafer by controlling the voltage decrement and duration.
Another notable patent is a method and apparatus for monitoring leakage current of a Faraday cup. This invention is integral to an ion implanter, where a current branch circuit is coupled with a Faraday cup and an operational amplifier. By dynamically monitoring the voltage output, Fong's invention allows for the accurate measurement of ion current, preventing overdosage of the wafer with the ion beam.
Career Highlights
Fong works at Advanced Ion Beam Technology, Inc., where he applies his expertise in ion implantation technology. His innovative approaches have positioned him as a key player in the field, contributing to advancements that enhance the efficiency and safety of ion implantation processes.
Collaborations
Fong collaborates with talented individuals such as Terry Sheng and Peter Mok. Their combined efforts foster a creative environment that drives innovation and technological advancements.
Conclusion
Steven Fong's contributions to the field of ion implantation technology are noteworthy. His patents reflect a commitment to innovation and improvement in the industry. As he continues to develop new technologies, Fong remains a significant figure in the realm of inventors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
