The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Apr. 02, 2009
Terry Sheng, Saratoga, CA (US);
Peter Mok, Fremont, CA (US);
Jason Hong, San Jose, CA (US);
Steven Fong, San Jose, CA (US);
Gongyuan Qu, San Jose, CA (US);
Terry Sheng, Saratoga, CA (US);
Peter Mok, Fremont, CA (US);
Jason Hong, San Jose, CA (US);
Steven Fong, San Jose, CA (US);
Gongyuan Qu, San Jose, CA (US);
Advanced Ion Beam Technology, Inc., San Jose, CA (US);
Abstract
A method and an apparatus for dechucking an electrostatic chuck are disclosed. The gas escapes through an opening between a wafer and a chuck in each stage of a multi-stages process. In each stage, during at least a portion of the stage, the chucking voltage is reduced to a value less than the least threshold voltage needed for holding the wafer, so that the wafer is pushed away from the chuck by the gas. Hence, the gas can escape from an opening between the wafer and the chuck, thereby increasing the dechucking rate. By controlling the decrement and/or the duration of the reduced voltage, any potential damages due to the pushed-away wafer can be minimized.