Tempe, AZ, United States of America

Steven D Marcus

This inventor holds 2 USPTO granted patents. Top assignees: Mattson Technology, Inc, Steag Rtp Systems Gmbh. Active years: 2000-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Steven D Marcus. Retrieved from https://idiyas.com/inventor/steven-d-marcus-6xbn2gmy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2000-2001

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2 patents (USPTO):Explore Patents

Title: Innovations by Steven D. Marcus: A Glimpse into His Patents and Career

Introduction

Steven D. Marcus, an accomplished inventor based in Tempe, Arizona, has made significant contributions to the field of materials science and silicon processing. With a portfolio of two patents, he continues to pave the way for innovative techniques in semiconductor technology.

Latest Patents

Steven D. Marcus's most recent patents focus on advancements in silicon oxynitride films and methods for rapid thermal processing (RTP) of ion-implanted silicon.

His first patent describes a silicon oxynitride film that is predominantly an oxide film at the interface with the substrate. Notably, the nitrogen content of the film increases as the distance from the silicon or silicon-germanium substrate grows. This innovative film is created through a method involving the rapid processing of a clean silicon wafer in a nitrogen-rich environment with a minimal presence of oxygen.

The second patent presents a method for RTP of a silicon substrate that has been implanted with dopant ions. This process entails contacting the surface with a reactive gas and employing a two-step processing technique to form a protective layer and activate dopants effectively. The result is a substrate with implanted areas achieving a sheet resistivity of less than 500 ohms per square, with careful control to prevent the movement of dopant ions beyond 80 nanometers from the surface.

Career Highlights

Steven has a proven track record working with reputable organizations in the semiconductor industry, including Mattson Technology, Inc. and Steag RTP Systems GmbH. His experience in these companies has contributed to his expertise and innovative prowess in developing cutting-edge technologies.

Collaborations

Throughout his career, Steven D. Marcus has collaborated with notable professionals such as Dim-Lee Kwong and Jeff Gelpey. These partnerships have fostered a dynamic exchange of ideas and innovations, resulting in significant advancements within the semiconductor field.

Conclusion

Steven D. Marcus's inventive work continues to impact the semiconductor industry positively. His ongoing commitment to innovation exemplifies the spirit of technological advancement, making him a noteworthy figure in the realm of patents and inventions. As the demand for more efficient and effective silicon processing techniques grows, his contributions will undoubtedly play a critical role in shaping the future of this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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