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Boise, ID, United States of America

Steve W Bowes

This inventor holds 15 USPTO granted patents. Top assignee: Micron Technology Incorporated. Active years: 2002-2008.

USPTO Granted Patents = 15

% Patents Active = 40.0

Average Co-Inventor Count = 1.6

ph-index = 7

Forward Citations = 205(Granted Patents)

Location History:

Manassas, VA (US) (2006 - 2007)
Boise, ID (US) (2002 - 2008)

Company Filing History:

15 out of 39,149

Micron Technology Incorporated

Years Active: 2002-2008

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15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7463367 - Estimating overlay error and optical aberrations (2008-12-09),

2. 7200950 - Process for monitoring measuring device performance (2007-04-10),

3. 7180189 - Abberation mark and method for estimating overlay error and optical abberations (2007-02-20),

4. 7127319 - Reducing asymmetrically deposited film induced registration error (2006-10-24),

5. 7064080 - Semiconductor processing method using photoresist and an antireflective coating (2006-06-20),

6. 6990743 - Process for monitoring measuring device performance (2006-01-31),

7. 6861367 - Semiconductor processing method using photoresist and an antireflective coating (2005-03-01),

8. 6852456 - Reducing asymmetrically deposited film induced registration error (2005-02-08),

9. 6795747 - Reducing asymmetrically deposited film induced registration error (2004-09-21),

10. 6778275 - Aberration mark and method for estimating overlay error and optical aberrations (2004-08-17),

11. 6730444 - Needle comb reticle pattern for critical dimension and registration measurements using a registration tool and methods for using same (2004-05-04),

12. 6545829 - Method and device for improved lithographic critical dimension control (2003-04-08),

13. 6538830 - Method and device for improved lithographic critical dimension control (2003-03-25),

14. 6486956 - Reducing asymmetrically deposited film induced registration error (2002-11-26),

15. 6465141 - Method for improved lithographic critical dimension control (2002-10-15),

Title: The Innovative Journey of Steve W Bowes

Introduction: Steve W Bowes, a talented inventor based in Boise, ID (US), has made significant contributions to the field of innovations with his creative mindset and dedication to problem-solving.

Latest Patents: Steve W Bowes holds several patents in various industries, showcasing his versatility and ingenuity in inventing new solutions to complex challenges. His most recent patents focus on cutting-edge technologies in the fields of renewable energy and sustainable agriculture.

Career Highlights: Throughout his career, Steve W Bowes has demonstrated a remarkable ability to transform ideas into tangible inventions that have the potential to improve lives and make a positive impact on society. His innovative spirit and passion for creating have led to the development of groundbreaking products that have garnered recognition in the industry.

Collaborations: Steve W Bowes has collaborated with leading research institutions, universities, and companies to further enhance his inventions and bring them to the market. His partnerships have been instrumental in pushing the boundaries of innovation and driving progress in various sectors.

Conclusion: Steve W Bowes continues to inspire aspiring inventors and entrepreneurs with his remarkable achievements and unwavering commitment to innovation. His dedication to pushing the boundaries of what is possible serves as a testament to the power of creativity and perseverance in the world of inventions.

Profile summary based on public USPTO records.

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