Steve S Mak

Title: Steve S Mak: Innovator in Advanced Mask Patterning Technology

Introduction

Steve S Mak is a prominent inventor based in Pleasanton, CA (US). He has made significant contributions to the field of imaging structures, particularly in advanced mask patterning technology. With a total of 11 patents to his name, Mak has established himself as a key figure in the industry.

Latest Patents

Among his latest patents is the innovative concept of advanced mask patterning with a patterning layer. This technology involves fabricating an imaging structure, such as a mask or reticle, using a patterning layer on an imaging layer. The patterning layer possesses substantially different etch properties compared to the imaging layer. The process includes a first etch that is selective of the patterning layer concerning a resist layer, followed by a second etch that is selective of the imaging layer with respect to the patterning layer.

Career Highlights

Throughout his career, Steve S Mak has worked with leading companies in the technology sector, including Applied Materials, Inc. and Intel Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in imaging technology.

Collaborations

Some of his notable coworkers include James S Papanu and Gerald Z Yin. Their collaboration has likely played a role in the development of innovative solutions in the field.

Conclusion

Steve S Mak's contributions to advanced mask patterning technology highlight his expertise and dedication to innovation. His work continues to influence the industry and pave the way for future advancements.