Company Filing History:
Years Active: 2001-2002
Title: Innovations of Stephen Wayne Hensiek
Introduction
Stephen Wayne Hensiek is a notable inventor based in Foley, MO (US). He has made significant contributions to the field of semiconductor processing, holding a total of 2 patents. His work focuses on improving the quality and efficiency of semiconductor wafers, which are essential components in modern electronics.
Latest Patents
Hensiek's latest patents include a "Process for reducing surface variations for polished wafer" and a "Method for processing a semiconductor wafer." The first patent describes a process that enhances the nanotopology and flatness of polished wafers by addressing issues such as edge ring phenomena and back side laser marks. This innovative method involves mounting the wafer on a polishing block with wax, allowing for stress removal without degrading the bond during polishing. The second patent outlines a comprehensive method for processing semiconductor wafers sliced from single-crystal ingots. This method includes lapping, etching, and double-side polishing operations to ensure uniformity and flatness of the wafer surfaces.
Career Highlights
Hensiek is currently employed at Memc Electronic Materials, Inc., where he applies his expertise in semiconductor technology. His work has contributed to advancements in the manufacturing processes of semiconductor materials, which are crucial for the electronics industry.
Collaborations
Throughout his career, Hensiek has collaborated with notable colleagues, including Yun-Biao Xin and Henry Frank Erk. These collaborations have fostered innovation and development in semiconductor processing techniques.
Conclusion
Stephen Wayne Hensiek's contributions to semiconductor technology through his patents and career at Memc Electronic Materials, Inc. highlight his role as a key innovator in the field. His work continues to influence the efficiency and quality of semiconductor manufacturing processes.