Stephan Heinrich

Title: Innovations by Inventor Stephan Heinrich

Introduction

Stephan Heinrich is a notable inventor based in Freiberg, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the area of epitaxial layer deposition. With a total of 2 patents, his work has advanced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Stephan Heinrich's latest patents include a method for depositing an epitaxial layer on the front side of a semiconductor wafer. This method addresses variations in wafer thickness caused by non-uniform chemical vapor deposition (CVD) at angular positions corresponding to the crystallographic orientation of the wafer. By providing a ring below the susceptor with inward projections, the method reduces radiant heat impinging upon the wafer at positions of increased deposition. Another patent focuses on a method that involves heating the semiconductor wafer to a deposition temperature using thermal radiation directed to both the front and rear sides. This innovative approach selectively reduces the intensity of thermal radiation directed to the rear side, allowing for a more uniform growth rate of the epitaxial layer across the wafer.

Career Highlights

Stephan Heinrich is currently employed at Siltronic AG, a leading company in the semiconductor industry. His work at Siltronic AG has positioned him as a key player in advancing semiconductor technologies. His expertise in epitaxial layer deposition has contributed to the company's reputation for high-quality semiconductor products.

Collaborations

Throughout his career, Stephan has collaborated with notable colleagues, including Joerg Haberecht and Rene Stein. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Stephan Heinrich's contributions to semiconductor technology through his patents and work at Siltronic AG highlight his role as an influential inventor. His innovative methods for epitaxial layer deposition continue to impact the industry positively.