The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2024
Filed:
Apr. 29, 2020
Applicant:
Siltronic Ag, Munich, DE;
Inventors:
Joerg Haberecht, Freiberg, DE;
Stephan Heinrich, Freiberg, DE;
Reinhard Schauer, Laufen, DE;
Rene Stein, Bobritzsch-Hilbersdorf, DE;
Assignee:
SILTRONIC AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/12 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C30B 25/10 (2006.01); H01L 21/02 (2006.01); H01L 21/687 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
C30B 25/12 (2013.01); C23C 16/4584 (2013.01); C23C 16/46 (2013.01); C30B 25/105 (2013.01); H01L 21/0262 (2013.01); H01L 21/68764 (2013.01); H01L 23/544 (2013.01); H01L 2223/54493 (2013.01);
Abstract
Variations in wafer thickness due to non-uniform CVD depositions at angular positions corresponding to crystallographic orientation of the wafer are reduced by providing a ring below the susceptor having inward projections at azimuthal positions which reduce radiant heat impinging upon the wafer at positions of increased deposition.