Rene Stein

Title: Innovations by Inventor Rene Stein

Introduction

Rene Stein is a notable inventor based in Bobritzsch-Hilbersdorf, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods for improving the deposition of epitaxial layers on semiconductor wafers.

Latest Patents

Rene Stein's latest patents include a method for depositing an epitaxial layer on the front side of a semiconductor wafer. This method addresses variations in wafer thickness caused by non-uniform chemical vapor deposition (CVD) at angular positions that correspond to the crystallographic orientation of the wafer. By providing a ring below the susceptor with inward projections, the method reduces radiant heat impinging upon the wafer at positions of increased deposition. Another patent involves a similar method that includes arranging the semiconductor wafer on a susceptor, heating it to a deposition temperature, and conducting a deposition gas over the front side. This method selectively reduces the intensity of thermal radiation directed to the rear side of the wafer, allowing for more uniform growth rates of the epitaxial layer.

Career Highlights

Rene Stein is currently employed at Siltronic AG, a leading company in the semiconductor industry. His innovative approaches have contributed to advancements in semiconductor manufacturing processes.

Collaborations

Some of his coworkers include Joerg Haberecht and Stephan Heinrich, who collaborate with him on various projects within the company.

Conclusion

Rene Stein's contributions to semiconductor technology through his patents demonstrate his commitment to innovation in the field. His work continues to influence advancements in the industry.