The Hague, Netherlands

Sten Vollebregt

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sten Vollebregt. Retrieved from https://idiyas.com/inventor/sten-vollebregt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Unveiling the Inventive Mind of Sten Vollebregt in 's-Gravenhage

Introduction:

Sten Vollebregt is a visionary inventor hailing from 's-Gravenhage, NL, with a passion for cutting-edge technologies. With a notable patent under his belt, Sten Vollebregt has made significant contributions to the field of graphene pellicle lithographic apparatus.

Latest Patents:

Sten Vollebregt's groundbreaking patent titled "Graphene Pellicle Lithographic Apparatus" introduces a catalyst comprising a first layer with a transition metal, a base layer, and an interlayer. This innovative catalyst paves the way for synthesizing graphene and producing high-quality pellicles for lithography apparatus.

Career Highlights:

Sten Vollebregt is affiliated with ASML Netherlands B.V., a renowned technology company at the forefront of semiconductor manufacturing equipment. His association with ASML highlights his expertise in the industry and his commitment to advancing technological solutions for complex challenges.

Collaborations:

In his professional journey, Sten Vollebregt has collaborated with talented individuals in the field, including Evgenia Kurganova and Adrianus Johannes Maria Giesbers. These collaborations have not only enriched his work but have also led to the exchange of innovative ideas and methodologies.

Conclusion:

Sten Vollebregt's inventive spirit and dedication to technological advancements shine through his significant contributions in the realm of graphene pellicle lithographic apparatus. His patent stands as a testament to his ingenuity and commitment to pushing the boundaries of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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