This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Atotech Deutschland Gmbh. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Steffen Pollack: Innovator in End Effector Technology
Introduction
Steffen Pollack is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of engineering, particularly in the development of innovative technologies for handling substrates. His work has led to the creation of a unique patent that addresses specific challenges in substrate manipulation.
Latest Patents
Steffen Pollack holds a patent for an "End effector for slab formed substrates." This invention features an end effector designed for clamping a slab formed substrate. The device includes a rim section that is arranged approximately and partially in the substrate's main plane. It comprises a pressing device that provides a pressing area and a support device that offers a support area. In the clamped state, the end effector is capable of clamping the substrate at a first surface by the pressing area and at a second surface, which is on the opposite side of the substrate, by the support area. Additionally, the end effector includes a guide for guiding the pressing device relative to the support device.
Career Highlights
Throughout his career, Steffen Pollack has worked with Atotech Deutschland GmbH and Atotech Deutschland GmbH & Co. KG. His experience in these companies has allowed him to refine his skills and contribute to various innovative projects.
Collaborations
One of his notable collaborators is Siegfried Ickert. Their partnership has likely fostered advancements in their respective fields.
Conclusion
Steffen Pollack's contributions to the field of engineering, particularly through his patent for an end effector, highlight his innovative spirit and dedication to solving complex problems in substrate handling. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
