Company Filing History:
Years Active: 2008-2010
Title: Steffen Gerlach: Innovator in Semiconductor Technology
Introduction
Steffen Gerlach is a notable inventor based in Giessen, Germany. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to defect detection and measurement techniques.
Latest Patents
Gerlach's latest patents include a method for detecting defects by three-way die-to-die comparison with false majority determination. This method involves determining defects in a plurality of images that have essentially the same image contents. A comparison operation is conducted once three fully comparable images are present in the intermediate memory, allowing for random access to the stored individual images. A paired comparison operation between the three difference images is then carried out.
Another significant patent is a method for measuring overlay shift. This method involves acquiring an image of at least one reference element that comprises at least one first pattern element in a first plane and at least one second pattern element in a second plane. An image of a measurement element is also acquired, and the shift value between the reference element and measurement element is determined by comparing the two images. The results are displayed on a user interface, indicating whether a predefined tolerance value is exceeded.
Career Highlights
Steffen Gerlach is currently employed at Vistec Semiconductor Systems GmbH, where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing the capabilities of defect detection and measurement in the industry.
Collaborations
Gerlach collaborates with talented professionals in his field, including Detlef Michelsson and Bernd Jungmann. Their combined expertise contributes to the success of their projects and innovations.
Conclusion
Steffen Gerlach is a prominent figure in semiconductor technology, with a focus on innovative methods for defect detection and measurement. His contributions through patents and collaboration with industry professionals highlight his commitment to advancing technology in this field.