The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2008
Filed:
Jul. 16, 2004
Applicant:
Steffen Gerlach, Giessen, DE;
Inventor:
Steffen Gerlach, Giessen, DE;
Assignee:
Vistec Semiconductor Systems GmbH, Weilburg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for measuring overlay shift is disclosed. An image is acquired of at least one reference element that comprises at least one first pattern element in a first plane and at least one second pattern element in a second plane. An image of a measurement element is likewise acquired. The shift value between the reference element and measurement element is ascertained by comparing the image of the reference element with the image of the measurement element. An output on a user interface indicates whether a predefined tolerance value is being exceeded.