Company Filing History:
Years Active: 2010-2013
Title: Innovations of Stefan Sawusch
Introduction
Stefan Sawusch is a notable inventor based in Pirna, Germany. He has made significant contributions to the field of gas distribution and etching processes, holding a total of 2 patents. His work is characterized by innovative methods that enhance efficiency and precision in various applications.
Latest Patents
One of his latest patents is a "Flow control method for multizone gas distribution." This method involves supplying and controlling the flow of a process gas to a process chamber. It includes initiating a known flow rate of a process gas, dividing it into two flows at different rates, measuring associated pressures, and adjusting the flow rates to meet target conditions. Another significant patent is the "Method for adjusting a critical dimension in a high aspect ratio feature." This method focuses on adjusting the lateral critical dimensions of features formed on a substrate using a dry etching process, incorporating intermediate sub-layers to ensure precision during etching.
Career Highlights
Stefan Sawusch is currently employed at Tokyo Electron Limited, where he applies his expertise in gas distribution and etching technologies. His innovative approaches have contributed to advancements in the semiconductor industry, showcasing his commitment to enhancing manufacturing processes.
Collaborations
Stefan has collaborated with esteemed colleagues such as Toshifumi Nagaiwa and Junichi Sasaki. Their combined efforts have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Stefan Sawusch's contributions to innovation in gas distribution and etching processes highlight his role as a leading inventor in his field. His patents reflect a dedication to improving efficiency and precision in technology applications.