Company Filing History:
Years Active: 2013
Title: The Innovations of Inventor Ssu-Yu Li
Introduction
Ssu-Yu Li, an inventive mind based in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor technology. With 1 patent to his name, he has proven his capability in creating innovative solutions to complex engineering challenges.
Latest Patents
Ssu-Yu Li's recent patent, titled "Method of fabricating a sealing structure for high-k metal gate," provides a novel approach to semiconductor devices. This invention details a semiconductor substrate that houses a transistor featuring a gate stack composed of high-k dielectric and metal gate. The patent emphasizes a sealing layer on the sidewalls of the gate stack, enhancing the functionality and reliability of modern semiconductor components by integrating an inner edge interfacing with the gate stack sidewall and a carefully aligned lightly doped source/drain (LDD) region.
Career Highlights
Currently, Ssu-Yu Li is part of the esteemed Taiwan Semiconductor Manufacturing Company Ltd., where he collaborates with top professionals in the semiconductor industry. His expertise and innovative approaches contribute to the robust research and development environment of his workplace.
Collaborations
Throughout his career, Ssu-Yu Li has collaborated with talented coworkers such as Chien-Hao Chen and Hao-Ming Lien. These partnerships foster a creative atmosphere that promotes the advancement of technology in the semiconductor field.
Conclusion
Ssu-Yu Li exemplifies the spirit of innovation within the semiconductor industry in Taiwan. His contributions, particularly through his patent for a method of fabricating sealing structures, highlight the critical role inventors play in advancing technology. By continually pushing the envelope, Li and his colleagues at Taiwan Semiconductor Manufacturing Company Ltd. set the stage for future breakthroughs in semiconductor technology.