Sourav Dutta

Title: Innovations by Sourav Dutta

Introduction

Sourav Dutta is an accomplished inventor based in Hillsboro, OR (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced capacitor structures. With a total of 2 patents to his name, Dutta's work is paving the way for innovations in non-volatile memory devices and integrated circuits.

Latest Patents

Dutta's latest patents include groundbreaking technologies such as the "Ferroelectric capacitor within backside interconnect" and "Capacitor structure embedded within source or drain region." The first patent describes a capacitor structure that features a layer of ferroelectric material sandwiched between two electrodes. This innovative design allows for a backside contact that connects to a transistor terminal, enhancing the efficiency of integrated circuits. The second patent focuses on integrating a capacitor structure with the source or drain region of a semiconductor device, which improves the overall performance and functionality of the device.

Career Highlights

Sourav Dutta is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing new techniques that enhance the performance of electronic devices. Dutta's expertise in ferroelectric materials and capacitor structures has positioned him as a key player in the industry.

Collaborations

Dutta collaborates with various professionals in the field, including his coworker Uygar E Avci. Together, they work on innovative projects that aim to advance semiconductor technology and improve device performance.

Conclusion

Sourav Dutta's contributions to the field of semiconductor technology are noteworthy. His innovative patents and work at Intel Corporation highlight his commitment to advancing electronic device performance. Dutta's ongoing research and development efforts will undoubtedly continue to shape the future of technology.