This inventor holds 1 USPTO granted patent. Top assignee: Globalfoundries Singapore Pte. Ltd.. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: The Innovations of Soon Yoong Loh: Pioneering Advances in Semiconductor Technology
Introduction: Soon Yoong Loh is an accomplished inventor based in Masai, Malaysia, known for his significant contributions to the field of semiconductor technology. With a commitment to innovation, Loh has developed a method that enhances the fabrication process of semiconductor devices, showcasing his expertise and creativity in engineering.
Latest Patents: Soon Yoong Loh holds a patent for a groundbreaking invention titled "Method for Reducing Sidewall Etch Residue." This innovative method involves the formation of a first layer over a substrate, followed by the application of a second layer. A patterned masking layer is then applied, leading to the creation of a patterned second layer with outwardly tapered sidewalls through isotropic etching. Finally, a patterned first layer is derived by etching the first layer in accordance with the patterned second layer. This invention is poised to improve the efficiency and effectiveness of semiconductor device fabrication.
Career Highlights: Loh's career is marked by his role at GlobalFoundries Singapore Pte. Ltd., a prominent company in the semiconductor industry. His work focuses on developing advanced technologies that push the boundaries of what's possible in electronic devices. His patent is a testament to his innovative mindset and commitment to solving complex engineering challenges.
Collaborations: Throughout his career, Soon Yoong Loh has had the opportunity to collaborate with esteemed colleagues in the industry, including Carol Goh and Kin Wai Tang. These collaborations have fostered an environment of creativity and innovation, allowing for the exchange of ideas and the development of pioneering technologies.
Conclusion: Soon Yoong Loh is a significant figure in the world of semiconductor innovations. His patented method for reducing sidewall etch residue represents a crucial advancement in fabrication technology. As he continues to work at GlobalFoundries Singapore Pte. Ltd., Loh's contributions will undoubtedly influence the future of semiconductor manufacturing and technology advancement.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile