Soo Young Hwang

Title: The Innovations of Soo Young Hwang

Introduction

Soo Young Hwang is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of polymer science, particularly in the development of materials used in semiconductor manufacturing. With a total of 4 patents to his name, Hwang's work has had a considerable impact on various industries.

Latest Patents

Hwang's latest patents include an ethylene-(meth)acrylic acid copolymer and a water-dispersive composition that incorporates this copolymer. This innovative copolymer features a portion with a melting temperature of 94°C or higher, with a content measured by Successive Self-nucleation and Annealing (SSA) analysis being 1.5% or less. Additionally, he has developed a polymer for preparing resist underlayer films, which is crucial in the manufacturing process of semiconductors and displays. This polymer optimizes etching selectivity and planarization characteristics, making it suitable for use as a hard mask in multilayer semiconductor lithography processes.

Career Highlights

Throughout his career, Soo Young Hwang has worked with prominent companies such as SK Innovation Co., Ltd. and SK Global Chemical Co., Ltd. His expertise in polymer technology has positioned him as a key player in the advancement of materials for electronic applications.

Collaborations

Hwang has collaborated with talented individuals in his field, including Jin Su Ham and Min Ho Jung. These partnerships have contributed to the successful development of innovative materials and processes.

Conclusion

Soo Young Hwang's contributions to polymer science and semiconductor manufacturing highlight his role as a leading inventor in his field. His patents reflect a commitment to innovation and excellence, paving the way for future advancements in technology.