Company Filing History:
Years Active: 2023-2025
Title: Innovations of Sonosuke Ishiguro
Introduction
Sonosuke Ishiguro is a notable inventor based in Kiyosu, Japan. He has made significant contributions to the field of polishing compositions and semiconductor substrates. With a total of 2 patents, Ishiguro's work has advanced the technology used in surface treatment processes.
Latest Patents
Ishiguro's latest patents include a polishing composition and a method for producing a polishing composition. The polishing composition contains abrasive grains, an additive, a pH adjusting agent, and a dispersing medium. Notably, the zeta potential of the abrasive grains is negative, and the additive is a crosslinked bicyclic compound with a tertiary nitrogen atom. The content of the additive is between 0% and 0.5% by mass relative to the entire polishing composition mass, with a pH of less than 5. Additionally, he has developed a surface treatment composition that effectively removes organic residues from polished surfaces. This composition includes a polymer with specific building blocks, a chelating agent, and water, ensuring thorough surface treatment after polishing.
Career Highlights
Ishiguro is currently associated with Fujimi Incorporated, where he continues to innovate in the field of polishing and surface treatment technologies. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor substrate production.
Collaborations
Some of his notable coworkers include Tsutomu Yoshino and Shogo Onishi, who have collaborated with him on various projects within the company.
Conclusion
Sonosuke Ishiguro's contributions to polishing compositions and semiconductor substrates highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving surface treatment processes, making a lasting impact in his field.