The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Aug. 03, 2021
Applicant:
Fujimi Incorporated, Kiyosu, JP;
Inventors:
Tsutomu Yoshino, Kiyosu, JP;
Sonosuke Ishiguro, Kiyosu, JP;
Assignee:
FUJIMI INCORPORATED, Kiyosu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/37 (2006.01); C11D 1/00 (2006.01); C11D 3/36 (2006.01); C11D 11/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C11D 3/3773 (2013.01); C11D 1/008 (2013.01); C11D 3/365 (2013.01); C11D 11/0047 (2013.01); H01L 21/02074 (2013.01);
Abstract
Provided is a means capable of sufficiently removing organic residues on the surface of an object to be polished after polishing. A surface treatment composition includes a polymer having a building block represented by Formula (1) in [Chemical Formula 1], a chelating agent, and water and is used to treat the surface of an object to be polished after polishing, and the chelating agent has at least one of a phosphonic acid group and a carboxylic acid group. In Formula (1), Ris a hydrocarbon group having 1 to 5 carbon atoms; and Ris a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms.