Singapore, Singapore

Ski Sim

This inventor holds 1 USPTO granted patent. Top assignee: Kla Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ski Sim. Retrieved from https://idiyas.com/inventor/ski-sim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ski Sim

Introduction

Ski Sim is an accomplished inventor based in Singapore, SG. She has made significant contributions to the field of semiconductor manufacturing through her innovative work. With a focus on machine learning applications, Ski has developed a unique approach to classifying wafer maps.

Latest Patents

Ski Sim holds a patent for "Wafer level spatial signature grouping using transfer learning." This patent involves a machine learning-based model that classifies wafer maps by utilizing transfer learning techniques. The model is trained using images from various sources, which are extracted and augmented to enhance feature extraction. These features are then classified into defects that may occur during semiconductor manufacturing. She has 1 patent to her name.

Career Highlights

Ski Sim is currently employed at Kla Corporation, where she applies her expertise in machine learning to advance semiconductor technologies. Her work has been instrumental in improving the efficiency and accuracy of defect classification in wafer maps.

Collaborations

Ski collaborates with talented coworkers, including Alán Dávila and P Jithendra Kumar Reddy. Their combined efforts contribute to the innovative projects at Kla Corporation.

Conclusion

Ski Sim's contributions to the field of semiconductor manufacturing through her innovative patent and collaborative work highlight her as a key figure in the industry. Her dedication to advancing technology continues to make a significant impact.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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