Kuala Lumpur, Malaysia

Sivanesan A/l Sathiapalan

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Nxp USA, Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sivanesan A/l Sathiapalan. Retrieved from https://idiyas.com/inventor/sivanesan-al-sathiapalan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovator Sivanesan A/l Sathiapalan and His Contributions to Semiconductor Technology.

Introduction

Sivanesan A/l Sathiapalan is a notable inventor based in Kuala Lumpur, Malaysia. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Sivanesan holds a patent for a "Pre-plated substrate for die attachment." This method involves attaching a semiconductor die to a substrate by providing a substrate that includes an attachment layer at its surface. The attachment layer is protected by a flash plating layer, which has a reflow temperature that is equal to or less than that of the attachment layer. The process includes preheating the substrate, attaching the semiconductor die, and subsequently cooling both the substrate and the die.

Career Highlights

Sivanesan is currently employed at NXP USA, Inc., where he continues to work on advancements in semiconductor technology. His expertise and innovative approach have positioned him as a valuable asset in his field.

Collaborations

Sivanesan collaborates with various professionals, including his coworker David F Abdo, to further enhance the development of semiconductor technologies.

Conclusion

Sivanesan A/l Sathiapalan's contributions to semiconductor technology through his patent demonstrate his innovative spirit and commitment to advancing the industry. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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