This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Semiconductor Manufacturing International (Beijing) Corporation, Semiconductor Manufacturing International (Shanghai) Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Siriguleng Zhang: Innovator in Semiconductor Technology
Introduction
Siriguleng Zhang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in semiconductor structures.
Latest Patents
Siriguleng Zhang holds a patent for a "Method for forming semiconductor structure." This method involves several steps, including providing a first substrate with specific ion concentrations, forming multiple epitaxial layers, and thinning the substrate to expose the surface of the second epitaxial layer. This patent showcases his expertise in semiconductor fabrication and design.
Career Highlights
Throughout his career, Zhang has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in both Beijing and Shanghai. His experience in these leading firms has contributed to his knowledge and skills in semiconductor technology.
Collaborations
(Section skipped due to space constraints.)
Conclusion
Siriguleng Zhang's contributions to semiconductor technology through his innovative methods and patents highlight his role as a key figure in the industry. His work continues to influence advancements in semiconductor structures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile