This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2012.
Company Filing History:
Years Active: 2012
Title: Singo Furui: Innovator in Plasma Processing Technology
Introduction
Singo Furui is a notable inventor based in Amagasaki, Japan. He has made significant contributions to the field of plasma processing technology, particularly through his innovative patent that enhances the efficiency of wafer processing.
Latest Patents
Singo Furui holds a patent for a plasma processing apparatus and method. This invention involves a plasma processing apparatus that processes a wafer in a process vessel using plasma generated by microwave supply. A key feature of this apparatus is a transmissive window that includes a hanging portion made of the same material as the window itself. This design creates a gap between the hanging portion and the sidewall inner surface, which helps inhibit the generation of a strong electric field and plasma at the contact point. As a result, the amount of sputtered particles and radicals reaching the wafer is significantly reduced. He has 1 patent to his name.
Career Highlights
Singo Furui is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this company has allowed him to focus on advancing plasma processing technologies that are crucial for modern semiconductor fabrication.
Collaborations
Throughout his career, Singo Furui has collaborated with esteemed colleagues such as Kiyotaka Ishibashi and Junichi Kitagawa. These collaborations have further enriched his contributions to the field of plasma processing.
Conclusion
Singo Furui's innovative work in plasma processing technology exemplifies the impact of dedicated inventors in advancing semiconductor manufacturing. His patent reflects a significant step forward in improving wafer processing efficiency.