Simon L Chu

Title: The Innovative Contributions of Simon L. Chu

Introduction

Simon L. Chu is a prominent inventor based in Dobbs Ferry, NY (US). He has made significant contributions to the field of lithographic printing through his innovative patents. With a total of 10 patents to his name, Chu has established himself as a key figure in the industry.

Latest Patents

Among his latest patents are two notable inventions. The first is titled "Aluminum substrates useful for lithographic printing plates." This patent describes a method for producing aluminum substrates that involves mechanically graining at least one surface of an aluminum sheet to create a pumice grained surface, followed by electrolytic etching with alternating current. The second patent, "Electrochemically treated photo-lithographic plates," discloses lithographic plates with an aluminum base. The surface of these plates is made porous and hardened through a two-step anodization process involving alternating and direct current in different electrolytes.

Career Highlights

Simon L. Chu has had a successful career at Polychrome Corporation, where he has applied his expertise in lithographic technology. His work has contributed to advancements in the production of high-quality printing plates, enhancing the efficiency and effectiveness of lithographic printing processes.

Collaborations

Throughout his career, Chu has collaborated with notable colleagues, including Eugene Golda and Alan Leonard Wilkes. These partnerships have fostered innovation and have played a crucial role in the development of his patented technologies.

Conclusion

Simon L. Chu's contributions to the field of lithographic printing through his patents and collaborations highlight his importance as an inventor. His innovative methods and technologies continue to influence the industry and pave the way for future advancements.