The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 1979
Filed:
Nov. 21, 1977
Applicant:
Inventor:
Simon L Chu, Dobbs Ferry, NY (US);
Assignee:
Polychrome Corporation, Yonkers, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; C23F / ; C25D / ;
U.S. Cl.
CPC ...
96 75 ; 96 33 ; 96 8 / ; 148-627 ; 204 33 ; 204 / ; 204 42 ;
Abstract
There are disclosed herein lithographic plates having an aluminum base the surface of which has been made porous and hardened first by an alternating current anodization in a hydrochloric acid electrolyte and then by a direct current anodization in a sulfuric acid electrolyte.
Chu, Simon. (1979). Electrochemically treated photo-lithographic plates (U.S. Patent No. 4152158). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4152158
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile