The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 1978
Filed:
May. 19, 1977
Eugene Golda, Monsey, NY (US);
Alan Leonard Wilkes, Brewster, NY (US);
Simon Long Chu, Dobbs Ferry, NY (US);
Polychrome Corporation, Yonkers, NY (US);
Abstract
A method for producing a water developable lithographic printing plate which comprises treating at least one surface of a metal sheet substrate with a layer of a lithographically suitable, light sensitive, water soluble substance and subsequently coating the thus treated base sheet with an upper layer of a water insoluble, ink receptive, lithographically suitable photosensitive composition. Said photosensitive layers must be either both positive working or both negative working. Upon imagewise exposure through a mask by standard methods the exposed areas of said upper photosensitive composition are alternatively characterized as either water permeable or water impermeable and the unexposed areas are alternatively water impermeable or water permeable as opposed to the exposed areas. Upon said imagewise exposure, the exposed lower level areas in a negative system are rendered water insoluble whereas the exposed lower level areas in a positive system are rendered more water soluble than the unexposed areas.