Pfaffenhofen an der Ilm, Germany

Simon Haas


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Simon Haas: Innovator in EUV Radiation Technology

Introduction: Simon Haas, based in Pfaffenhofen an der Ilm, Germany, is a notable inventor recognized for his contributions in the field of optical arrangements for extreme ultraviolet (EUV) radiation. With a keen focus on innovation, Haas has secured a patent for a significant advancement that addresses critical challenges in optical systems.

Latest Patents: Haas holds a patent for an "Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma." This innovative optical arrangement includes at least one reflective optical element equipped with a coating that effectively reflects EUV radiation. A distinct feature of his invention is the integration of a shield that protects the surface regions of the optical element from the damaging etching effects of surrounding plasma during operation. The design ensures that the distance between the shield and the surface region is optimized to be less than the Debye length of the plasma, enhancing operational efficiency.

Career Highlights: Simon Haas has made significant strides in his career as an inventor at Carl Zeiss SMT GmbH, a leading company in the field of optical systems. His work not only exemplifies cutting-edge technology but also reflects the importance of research and development in maintaining competitiveness in the optical industry.

Collaborations: Throughout his career, Haas has collaborated with talented coworkers, including Bjoern Liebaug and Moritz Becker. Their combined expertise contributes to the innovative projects at Carl Zeiss SMT GmbH and fosters an environment of creativity and technological advancement.

Conclusion: Simon Haas stands out as an influential figure in the realm of optical engineering, particularly in the development of EUV radiation technologies. His patented invention demonstrates a commitment to innovation and addresses real-world challenges within the industry. As he continues to collaborate with other experts, Haas's contributions will undoubtedly pave the way for future advancements in optical technology.

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