Pingzhen, Taiwan

Simon Chang

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Simon Chang. Retrieved from https://idiyas.com/inventor/simon-chang-1h4lpzu3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Simon Chang: Innovator in Semiconductor Manufacturing

Introduction

Simon Chang is a notable inventor based in Pingzhen, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.

Latest Patents

Simon Chang holds a patent for an "Automatic N2 Purge System for 300 mm Full Automation Fab." This system is designed for manufacturing semiconductor integrated circuit (IC) devices. It includes an operating control system, a process intermediate station in communication with the operating control system, and a gas purge device. The gas purge device is integrated into the process intermediate station, enhancing the efficiency of the manufacturing process.

Career Highlights

Simon Chang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work focuses on advancing technologies that improve semiconductor production processes. With a patent portfolio that includes 1 patent, he has established himself as a key player in the industry.

Collaborations

Simon has collaborated with talented individuals such as Ko-Pin Chang and Jui-An Shih. These partnerships have contributed to the development of innovative solutions in semiconductor manufacturing.

Conclusion

Simon Chang's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to advancing technology in this critical field. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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