Sieu Ha

Title: Innovations of Inventor Sieu Ha

Introduction

Sieu Ha is a notable inventor based in Los Angeles, CA, who has made significant contributions to the field of semiconductor device fabrication. With a total of two patents to his name, he has focused on improving methods of electron beam lithography.

Latest Patents

Sieu Ha's latest patents include "Embedded high-Z marker material and process for alignment of multilevel e-beam lithography." This invention is directed toward enhanced methods of fabricating semiconductor devices using multi-level electron beam lithography. The patent details a process that involves forming an alignment marker in a substrate, which includes tantalum. It also describes how to determine the location of the edge of the alignment marker using a backscatter electron detector, based on atomic number contrast. This innovative approach allows for the formation of at least one transistor in the substrate, improving the overall efficiency of semiconductor device fabrication.

Career Highlights

Sieu Ha is currently employed at HRL Laboratories, LLC, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His work has been instrumental in advancing the capabilities of e-beam lithography, which is crucial for modern electronics.

Collaborations

Some of his notable coworkers include Christopher Bohn and Maxwell Choi, who collaborate with him on various projects at HRL Laboratories.

Conclusion

Sieu Ha's contributions to the field of semiconductor technology through his innovative patents and collaborative efforts highlight his importance as an inventor. His work continues to influence advancements in the industry, paving the way for future innovations.