Fremont, CA, United States of America

Sidney P Huey

USPTO Granted Patents = 25 

 

Average Co-Inventor Count = 5.0

ph-index = 9

Forward Citations = 222(Granted Patents)


Location History:

  • Oakland, CA (US) (2001 - 2003)
  • Milpitas, CA (US) (2001 - 2013)
  • Fremont, CA (US) (2010 - 2024)

Company Filing History:


Years Active: 2001-2024

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25 patents (USPTO):

Title: Sidney P. Huey: A Pioneer in CMP Component Monitoring Technology

Introduction

Sidney P. Huey, based in Fremont, CA, is an innovative inventor with a remarkable portfolio of 25 patents. His work primarily focuses on enhancing the efficiency of chemical mechanical polishing (CMP) systems, showcasing his dedication to advancing technology in a dynamically evolving industry.

Latest Patents

Among his latest inventions is a patent concerning the training of a machine learning system to detect an excursion of a CMP component using a time-based sequence of images. This inventive process entails monitoring operations of a polishing system by obtaining reference images from a test operation and comparing them with monitoring images captured during the actual polishing of substrates. The process utilizes advanced image processing algorithms to determine differences, subsequently indicating any excursions when certain thresholds are exceeded. A similar innovation focuses specifically on detecting excursions of CMP components, utilizing comparable methodologies to ensure precision and reliability in polishing operations.

Career Highlights

Sidney P. Huey is a valuable member of Applied Materials, Inc., a leader in the semiconductor, display, and solar industries. His contributions to the company have significantly impacted the performance and quality of CMP technologies used worldwide. His extensive experience in research and development has solidified his status as an authority in this field.

Collaborations

Throughout his career, Sidney has collaborated with other talented professionals, including Hung Chih Chen and Steven M. Zuniga. Their collective expertise has fostered an environment of innovation, resulting in breakthroughs that push the boundaries of current technology in polishing systems.

Conclusion

Sidney P. Huey exemplifies the spirit of innovation with his dedication to improving CMP technologies through his impressive number of patents. His work at Applied Materials, Inc. and collaborations with other professionals underscore the importance of teamwork in achieving groundbreaking advancements. As technological demands continue to grow, inventors like Sidney will play a crucial role in shaping the future of the industry.

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