The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2013

Filed:

Nov. 28, 2011
Applicants:

Hung Chih Chen, Sunnyvale, CA (US);

Steven M. Zuniga, Soquel, CA (US);

Charles C. Garretson, San Jose, CA (US);

Douglas R. Mcallister, Pleasanton, CA (US);

Jian Lin, Milpitas, CA (US);

Stacy Meyer, San Jose, CA (US);

Sidney P. Huey, Fremont, CA (US);

Jeonghoon OH, San Jose, CA (US);

Trung T. Doan, Los Gatos, CA (US);

Jeffrey Schmidt, San Jose, CA (US);

Martin S. Wohlert, San Jose, CA (US);

Kerry F. Hughes, San Francisco, CA (US);

James C. Wang, Saratoga, CA (US);

Danny Cam Toan LU, San Francisco, CA (US);

Romain Beau DE Lamenie, Menlo Park, CA (US);

Venkata R. Balagani, Gilroy, CA (US);

Aden Martin Allen, Oakland, CA (US);

Michael Jon Fong, Mill Valley, CA (US);

Inventors:

Hung Chih Chen, Sunnyvale, CA (US);

Steven M. Zuniga, Soquel, CA (US);

Charles C. Garretson, San Jose, CA (US);

Douglas R. McAllister, Pleasanton, CA (US);

Jian Lin, Milpitas, CA (US);

Stacy Meyer, San Jose, CA (US);

Sidney P. Huey, Fremont, CA (US);

Jeonghoon Oh, San Jose, CA (US);

Trung T. Doan, Los Gatos, CA (US);

Jeffrey Schmidt, San Jose, CA (US);

Martin S. Wohlert, San Jose, CA (US);

Kerry F. Hughes, San Francisco, CA (US);

James C. Wang, Saratoga, CA (US);

Danny Cam Toan Lu, San Francisco, CA (US);

Romain Beau De Lamenie, Menlo Park, CA (US);

Venkata R. Balagani, Gilroy, CA (US);

Aden Martin Allen, Oakland, CA (US);

Michael Jon Fong, Mill Valley, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.


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