Location History:
- Taipei, TW (2021 - 2022)
- New Taipei, TW (2022)
Company Filing History:
Years Active: 2021-2024
Title: Shyue-Ru Doong: Innovator in Etching Devices and Cellular Networks
Introduction
Shyue-Ru Doong is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the fields of etching devices and cellular networks. With a total of 8 patents to his name, Doong's work has had a considerable impact on technology.
Latest Patents
One of his latest patents is an operating method of an etching device. This method involves several steps, including the placement of a wafer on a wafer-mounting surface within a chamber. The wafer-mounting surface is aligned parallel to the direction of gravity. A gas is introduced from a gas source to a vacuum sealing device, where an inductive coil surrounding the vacuum sealing device excites the gas into plasma. This plasma is then injected onto the wafer. Another notable patent pertains to a cellular network that consists of multiple miniature base stations. These base stations are interconnected and each includes an antenna, a wireless signal transceiver, and a digital signal processor. The antenna is strategically placed at the periphery of the miniature base stations to facilitate the reception and transmission of wireless signals. The wireless signal transceiver is designed to demodulate incoming signals and modulate outgoing signals, while the digital signal processor processes these wireless signals.
Career Highlights
Shyue-Ru Doong has worked with notable companies such as Nan Ya Technology Corporation and Nanya Technologies Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in the technology sector.
Collaborations
He has collaborated with Feng-Ju Tsai, further enhancing his work and contributions to the field.
Conclusion
Shyue-Ru Doong is a distinguished inventor whose patents in etching devices and cellular networks showcase his innovative spirit and technical expertise. His contributions continue to influence the technological landscape.