The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2022
Filed:
Aug. 12, 2019
Applicant:
Nanya Technology Corporation, New Taipei, TW;
Inventors:
Shyue-Ru Doong, Taipei, TW;
Feng-Ju Tsai, Hsinchu County, TW;
Assignee:
NANYA TECHNOLOGY CORPORATION, New Taipei, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/02 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B08B 3/02 (2013.01); H01L 21/02041 (2013.01);
Abstract
A wafer cleaning apparatus includes a spin base, a first arm, and a second arm. The spin base is configured to support a wafer. The first arm is disposed above the spin base and configured to supply a chemical solution. The second arm is movably positioned above the spin base, and the second arm is configured to supply a first cleaning solution above the spin base when the first arm abnormally stops supplying the chemical solution.