The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2021

Filed:

Dec. 29, 2019
Applicant:

Nanya Technology Corporation, New Taipei, TW;

Inventors:

Feng-Ju Tsai, Hsinchu County, TW;

Shyue-Ru Doong, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/687 (2013.01); H01L 21/6719 (2013.01); H01L 21/67051 (2013.01); H01L 21/67196 (2013.01);
Abstract

A device includes a wafer chuck, a first nozzle, an actuator, and a first elongated cup. The first nozzle is disposed over the wafer chuck. The first elongated cup is coupled to the actuator. The actuator is capable of moving the first elongated cup from a first position to a second position. The first elongated cup shields the first nozzle from the wafer chuck at the first position. The first elongated cup is free of shielding the first nozzle from the wafer chuck at the second positon.


Find Patent Forward Citations

Tsai, Feng-Ju. (2021). Wet cleaning apparatus and manufacturing method using the same (U.S. Patent No. 10998218). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10998218

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